Device Fabrication Using Soft Lithography Technique V2

is a reproductive toxin and goes through gloves!

2. Wear cut resistant gloves when using the razor!

3. Always put the lid on when using the

Equipment

Value	Label
SCK-300	SCK-300P Spin Coater Kit
Spin Coater	TYPE
Intras Scientific	BRAND
SCK-300	SCK-300P Spin Coater Kit

Note: The wafer could come off and cut you, or could spray everywhere.

4. burns the eyes! Put on safety goggles when using

Hot Plates and Oven

The first step consists of turning one hot plate to 95°C and another hot plate to ~200°C

Turn on the

Equipment

Value	Label
BLACK+DECKER 4-Slice Convection Oven, Stainless Steel, TO1313SBD	NAME
Oven	TYPE
BLACK + DECKER HOME	BRAND
B00GGFHH4U	SKU

by turning the timer to "stay on" and the temperature to 60°C.

Equipment Checklist:

1. Tweezers (2)

2. Pyrex dish for the

3. waste beaker

4. waste beaker

5. solid Waste Container

6. Aluminum foil

7. Double sided tape

8. Glass Slabs (for exposure)

9. Timers

Equipment

Value	Label
SCK-300	SCK-300P Spin Coater Kit
Spin Coater	TYPE
Intras Scientific	BRAND
SCK-300	SCK-300P Spin Coater Kit

Ensure that the spin coater cover and base are covered with aluminum foil.

Ensure that the spin coater is programmed to the desired 2-step rpm (1000 rpm for 0h 0m 10s and the appropriate rpm for 0h 0m 30s; refer to Figure 1)

Place a piece of double sided tape on the spin coater.

The tape should cover the diameter of the spin coater stage and be centered.

Note: There may be times when the tape is not sticking to the spin coater stage. To mitigate this issue, clean the stage with to wash off chemicals that are preventing it from sticking:

1. Unscrew the stage portion of the spin coater
2. Place it on a separate clean beaker.
3. Pour onto it, just enough to submerge the surface of the stage. You can obtain the either from the "Used PGMEA bottle" so long as the number of times that it has been recycled is <10. Otherwise, obtain it from the fresh PGMEA squeeze bottle.
4. Agitate the beaker gently for 0h 5m 0s
5. After 0h 5m 0s, pick up the stage using tweezers and wash it off for the last time with fresh over the same beaker.
6. Wash the stage with over the waste beaker.
7. Blow dry the spin coater stage using the Dyson technique.
8. Proceed to place the double sided tape on the spin coater.
9. Discard the to the "Fully depleted PGMEA waste bottle".

Equipment

Value	Label
Silicon Wafer	NAME
SU-8 Substrate	TYPE
University Wafer	BRAND
ID-452	SKU

Locate or prepare a beaker for the waste .

Pick up the silicon wafer using the tweezer located in the fume hood.

Rinse the wafer with .

Make sure that the is ending up in the waste beaker for alcohol.

Subsequently, use compressed air to blow the alcohol off of the wafer (using the Dyson technique; ask Jann or Freeman if you are unsure)

Centre the silicon wafer on the spin-coater stage.

Note: It is imperative to centre the silicon wafer onto the spin coater stage as it can lead to uneven coating. If this occurs, proceed to wash off the on the wafer with for 0h 5m 0s using the instructions above over a Pyrex dish, not the beaker.

Obtain the NOT from the main SU-8 bottle but from the pre-made aliquots.

Place about 1mL to 2mL (the size of a quarter coin) of the on the centre of the wafer, taking care not to create air bubbles. Make sure also that you do not get any on the neck of the bottle because it would then be hard to close the bottle.

Note 1: DO NOT let the bottle be open for a longer period of time because the compound quickly evaporates and changes the compound in the bottle.

Note 2: Note that solid wastes should only be placed in the yellow container that is marked "SU-8 Solid Waste"

Spin the wafer according to the appropriate rpm (1000 for 0h 0m 10s and refer to Figure 1 for the appropriate rpm for 0h 0m 30s)

After spinning, pick up the wafer on its edge and place it on the 95°C hot plate for 0h 10m 0s

Note 1: Make sure that the double sided tape from the spin coater is not stuck on the bottom of the wafer before placing it on the hot plate.

Note 2: Adjust the soft bake times according to the thickness of the channel

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Place the wafer and the print out of the mask in between two pieces of glass such that the order is:

Glass | wafer | mask | Glass <––– UV Light

Note 1: Make sure that the mask is facing up – that is, the description (writings) on the mask is facing up. You can tell that the mask is facing up if you can read the description.

Important: Wear the UV glasses.

Ensure that the

Equipment

Value	Label
UV Flashlight	NAME
UV Flashlight	TYPE
Alonefire	BRAND
B09J885Q6N	SKU

is on full battery, that is, 4/4 bars.

Place the UV light apparatus over on top of the glasses. Make sure that the box is covering the entirety of the glasses. Make sure that you line up the UV light on the centre of the wafer and the mask.

Inform everyone in the lab before turning on

Expose for 0h 0m 30s

Heat the wafer again by placing it on the 95°C hot plate for 0h 3m 0s to 0h 5m 0s

Note 1: At this point you should be able to see the outlines of the channel on the wafer. No visible latent image during or after PEB means that there was insufficient exposure, temperature or both.

For this step, you would need a compound called . Locate first the bottle that says "Used PGMEA". If the number of times that the product has been reused is less than 10, proceed to use the "Used PGMEA". Otherwise, use fresh from the squeeze bottle or the actual bottle.

WARNING 1: goes through gloves – make sure that you double glove and/or change your gloves if you feel it necessary

WARNING 2: is a reproductive toxin – it is not good for pregnant women

Pour onto the Pyrex dish, just enough to submerge the wafer, thereby developing it.

If the has been used more than 10 times, dispose of it in the PGMEA waste container and obtain it from the original bottle.

Cover the Pyrex dish using aluminum foil.

Manually agitate (gentle) the Pyrex dish every once in a while.

The development time depends on the thickness (height) of the channels. See the table below for guidance.

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After the appropriate development time has passed, take out the wafer using tweezers.

Rinse the wafer with fresh (over the Pyrex dish)

Rinse the wafer with over the IPA waste beaker

If white precipitates arise, wash with fresh over the PGMEA waster beaker to wash off – NOT over to the Pyrex dish containing , then back into Pyrex dish to develop longer.

Repeat steps 24-25

If doesn't generate white precipitates, then blow dry off using the Dyson technique

Recycle the by pouring it back to the used PGMEA bottle (use the PGMEA funnel). Indicate that the has been used once more by writing a line on the bottle.

Note: If the number of lines has reached 10, discard the in the PGMEA waste container.

Place the wafer on the 200°C hot plate for 0h 2m 0s

At this point you should be able to view the channels on the device under the microscope. Place the device on a clean petri dish after baking and view the channel from there using the microscopes.

Label the petri dish with the dimensions of the channels, ID of the device, the date, your initials.

Prepare the by mixing the and in 1:11 ratio

For 30g, you would need 2.5g of the and fill the rest with the (desired final amount x 1/12 = amount of elastomer needed)

Mix vigorously using the Dremel tool or manually using the mixing sticks until you get an opaque colour and a lot of bubbles.

Degas or desiccate until the is clear is free from air bubbles using the

Equipment

Value	Label
Vacuum Desiccator	NAME
Ted Pella	BRAND
2246	SKU
Any vacuum desiccator that will fit your samples will work	SPECIFICATIONS

While waiting, place the wafer on a petri dish. Cover it so that it is free from dust.

Once the de-gassing is done, pour the on top of the wafer.

Make sure that the temperature of the oven is around 60°C. Place it in the oven for several hours or even 0h 2m 0s

Important: since the temperature of the oven fluctuates drastically, place the cover of the petri dish at the bottom by placing the device on top of it so that it does not melt.

After several hours, take the device out of the oven.

IMPORTANT: Wear the cut resistant gloves.

Cut the device mold using a scalpel. Make sure that you are not cutting into the channels and don't push too hard on the wafer or it will splinter

Peel the device mold using tweezers or your hands

Note 1: It is very easy to break the silicon wafer so when you are cutting or peeling off the device, be very careful not to break the wafer.

Punch the inlet and outlets of the device using the manual puncher.

Tape the device so that it would be free from dust.

Speak to Jann or Freeman about this or refer to the SOP for the Harrick Plasma Cleaner PDG-32G from the Matsuura Lab

IMPORTANT: Wear safety glasses!

To make the device mold hydrophobic – cut a piece off of the aquapel syringe tubing.

Stick the tubing into the channel, push just enough to get the liquid into the droplet making a nozzle.

Push air through the channel to clear it out.

Put in the oven for 0h 5m 0s to dry.

Seal the aquapel syringe tubing by melting the tubing end for a FEW seconds on the hot plate or lamp and sealing it with your gloved fingers.